Research at the Banerjee Lab aims to understand atomic scale processes that can lead to the development of new nanomaterials for energy applications. Special interest is in atomic layer deposition and atomic layer etching processes that can help engineer surfaces and interfaces with atomic scale resolution.
Location
University of Central Florida, Research 1 Building, 2nd Floor. 4353 Scorpius St., Orlando, FL 32816
Lab Size
1200 ft²
Equipment
- Atomic layer deposition (ALD) Furnace
A fully customized, home-built viscous flow ALD reactor capable of depositing Al2O3, ZnO, TiO2, Ta2O5, Ru and Cu thin films on planar substrates, as well as nanoparticle assemblies using a built-in rotary reactor. Active collaboration with SAFC Hitech provides all precursors for this system. - Quadrupole Mass spectrometer
The above ALD system is equipped with a Stanford Research System® (SRS) 300 a.m.u. quadrupole mass spectrometer for downstream process and chemistry diagnostics. - Atomic Layer Deposition (ALD) Chamber
A state-of-the-art, commercial FIJI Gen 2 VEECO® with over 6 precursor delivery options. A 6” chuck back-bias for atomic layer etching is personally owned by the PI. With this, the PI can deposit insulators, semiconductors, complex oxides, organic-inorganic thin films and metals. The system provides additional process capabilities by incorporating plasma-enhanced ALD in the chamber. The upper spectral range of the ellipsometer is in the NIR to handle metal films up to 50 nm thickness. - M2000D J. W. Woollam® spectroscopic ellipsometry
This system provides thickness measurements in both ex situ and in situ modes. The spectral range of the system covers 180 nm – 1690 nm allowing measurements of a wide array of dielectrics, semiconductors and metals (provided metal is < 50 nm in thickness). - Chemical Vapor Deposition
Custom-built chemical vapor deposition system for deposition of oxides, halides and oxyhalides. - Physical Vapor Deposition
Table-top high vacuum sputter from DEKTAK for metal electrode deposition. - Spin coating unit
Model No. VTC-100A, 0 – 8000 rpm spin coating unit from MTI Corporation for spin casting of sol-gel films. - High temperature heating chamber for Raman Microscope
Linkam® 0-1500°C heating stage inside a water cooled chamber for measuring Raman spectra under various ambients and vacuum. - General electrochemistry
Two fully automated electrochemical workstations for anodic aluminum oxide (AAO) nanotemplate processing. These stations are equipped with water chillers, high power source meters (INSTEK and Keithley 2400) and a customized Labview program to control anodization conditions. Templates on Al foils, Al thin films and Al wires have been made and demonstrated. - Electrochemical impedance spectroscopy
A Biologic® SP-200 potentiostat with Electrochemical Impedance Spectroscopy (EIS) capabilities provides methods to probe semiconductor-liquid interfaces. - Probe station
An ST-500 JANIS® cryogenic probe station capable of probing electrical properties of films as a function temperature (4K-475K), ambient pressure and various gases provides much of the electron transport characterization facilities within the lab. - Electrical meters
Keithley 2400 source measure units (4X), Agilent E4980A LCR meter, Princeton Applied Research Lock-In Amplifier 128A and Keithley Nanovoltmeter. - Monochromator
A Newport® Cornerstone 1/8 monochromator provides wavelength dependent excitation within the probe station. It also allows determining parameters such as quantum efficiency of charge generation. Current spectral range is from 350 nm – 1600 nm. - COMSOL® MULTIPHYSICS
Single-seat simulation software with electrical/electromagnetic, reaction kinetics and transport modules allowing modeling of a variety of multiphysics phenomena. - Other equipment
Additional processing and characterization systems include:- UV-1800 Shimadzu UV-Vis spectroscope
- Vacuum furnace and a light microscope (Leica)
- Various sources for lasers (405 nm, 535 nm and 785 nm) from Thor Labs®.
More Information
Parag Banerjee
Principal Investigator
Associate Professor, Materials Science & Engineering
parag.banerjee@ucf.edu
407-823-0190